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College of Engineering / 工學院
Materials Science and Engineering / 材料科學與工程學系
Improvement in electrical characteristics of HfO 2 gate dielectrics treated by remote NH 3 plasma
Details
Improvement in electrical characteristics of HfO 2 gate dielectrics treated by remote NH 3 plasma
Journal
Applied Surface Science
Journal Volume
266
Pages
89-93
Date Issued
2013
Author(s)
Huang, L.-T.
Chang, M.-L.
Huang, J.-J.
Lin, H.-C.
Kuo, C.-L.
Lee, M.-H.
CHEE-WEE LIU
MIIN-JANG CHEN
DOI
10.1016/j.apsusc.2012.11.097
URI
https://scholars.lib.ntu.edu.tw/handle/123456789/491767
URL
https://www.scopus.com/inward/record.uri?eid=2-s2.0-84872789354&doi=10.1016%2fj.apsusc.2012.11.097&partnerID=40&md5=b4ef9d0bcdd3680096e0ec59ac3cdfc2
SDGs
[SDGs]SDG6
[SDGs]SDG7
Type
journal article