Fabrication of Spin-on Luminescence Thin Films Using a mixture of Erbium Oxide and Ytterbium Oxide Nanoparticles
Date Issued
2007
Date
2007
Author(s)
Wu, Yi-Hang
DOI
zh-TW
Abstract
Because demand for data transmission increase very fast, research of fiber-optic communication becomes an important technology. It makes that Er3+ becomes an attractive issue for researches. Accompanying the blooming research in nanotechnology, many people focus on the surface effect of the nanoparticles and use it to increase emission efficiency. Nanotechnology provides a different way to solve the problem of data transmission. In this thesis, we provide a new .fabrication: using nanoparticles to fabricate erbium doped luminescence thin film. We mix nanoparticles and use spin coating process to deposit it on a silicon wafer.
The emitting layer emits light at 1530 nm which is a important wavelength in optical communication. The main compositions of emitting layer are Er3+ and spin-on glass (SOG). Erbium oxide nanoparticles are the source of Er3+, while SOG is widely used in semiconductor fabrication. We use SOG as host material to spin on silicon wafer in this thesis. We also add ytterbium oxide nanoparticles to increase the luminescence efficiency besides erbium oxide nanoparticles. Aluminum oxide nanoparticles and P2O5 are added to improve the surface condition of emitting layer. Besides using material of the experiment, the annealing process is an important topic and is investigated in this work. The surface condition of emitting layer and improvement will be discussed. Another physical property of emitting layer is upconversion luminescence. We can use near-infrared semiconductor laser to pump the device to produce luminescence. Through the process of multi-photon absorption, the electron can be excited to higher energy levels to produce visible light. In our measurement, we modulate the content of erbium oxide and ytterbium oxide to measure the change of visible light in order to realize the property of Er3+.
Comparing to other kinds of fabrication technology, like ion implantation and solid-phase epitaxy, new fabrication process is much simpler and less cost. This fabricating technique is a promising work and worth developing in the future.
Subjects
鉺離子
氧化鉺
erbium ion
erbium oxide
Type
thesis
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