Porous materials with ultra-low dielectric constant as antireflective coating layers for F 2 and ArF lithography
Journal
Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003
Pages
122-123
Date Issued
2003
Author(s)
Abstract
In this paper, optical characteristics of porous MSQ were measured for BARC applications. Optical constants of porous MSQ are (1.432, 0.004) and (1.245, 0.454) at 193 and 157 nm, respectively. For 157 nm, the porous MSQ film has suitable optical characteristics as a BARC layer.
Type
conference paper