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College of Electrical Engineering and Computer Science / 電機資訊學院
Electrical Engineering / 電機工程學系
Physical mechanism of HfO2-based bipolar resistive random access memory
Details
Physical mechanism of HfO2-based bipolar resistive random access memory
Journal
International Symposium on VLSI Technology, Systems, and Applications
Pages
110-113
Date Issued
2011
Author(s)
CHEE-WEE LIU
Chang, H.-L.
Li, H.-C.
Liu, C.W.
Chen, F.
Tsai, M.-J.
CHEE-WEE LIU
DOI
10.1109/VTSA.2011.5872253
URI
http://www.scopus.com/inward/record.url?eid=2-s2.0-79959919688&partnerID=MN8TOARS
http://scholars.lib.ntu.edu.tw/handle/123456789/365226
Type
conference paper