Real-time spatial control of photoresist development rate

Journal

Proc. SPIE , Metrology, Inspection, and Process Control for Microlithography

Pages

65182N

Date Issued

2007-03

Author(s)

Arthur Tay

Weng-Khuen Ho

Ni Hu

Choon-Meng Kiew

Kuen-Yu Tsai

DOI

10.1117/12.711509

URI

http://scholars.lib.ntu.edu.tw/handle/123456789/333764

Type

conference paper