Hole Confinement and 1/ f Noise Characteristics of SiGe Double-Quantum-Well p-Type Metal–Oxide–Semiconductor Field-Effect Transistors
Resource
Japanese Journal of Applied Physics Part1 45 (5A): 4006-4008
Journal
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Journal Issue
45
Pages
4006-4008
Date Issued
2006
Date
2006
Author(s)
Type
journal article
