A self-tuning run-by-run process controller for processes subject to random disturbances
Journal
Journal of the Chinese Institute of Engineers, Transactions of the Chinese Institute of Engineers,Series A/Chung-kuo Kung Ch'eng Hsuch K'an
Journal Volume
22
Journal Issue
5
Pages
627-638
Date Issued
1999
Author(s)
Abstract
In this paper a self-tuning run-by-run process controller is presented. The controller has the capability of choosing a control parameter dynamically in response to the underlying process disturbances. There are two modules in this controller: a self-tuning loop trigger module and a run-by-run feedback control module. In the self-tuning loop trigger module, two EWMA control charts are used sequentially to determine if there is a large or medium shift in the process output and to trigger a new self-tuning loop accordingly. In the run-by-run feedback control module, the control parameter and control model are re-tuned sequentially and a new process recipe is generated, on a run-by-run basis, to compensate for the process output's deviation from the target. Monte Carlo simulation results show that the self-tuning run-by-run process controller is superior to the current run-by-run process controller with a fixed control parameter. © 1999, Taylor & Francis Group, LLC.
Type
journal article