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College of Science / 理學院
Applied Physics / 應用物理研究所
High k Gate Dielectrics For Si And Compound Semiconductors By Molecular Beam Epitaxy
Details
High k Gate Dielectrics For Si And Compound Semiconductors By Molecular Beam Epitaxy
Journal
Crystalline oxide-silicon heterostructures and oxide optoelectronics
Journal Volume
747
Date Issued
2003
Author(s)
Kwo, J Raynien
MINGHWEI HONG
URI
http://scholars.lib.ntu.edu.tw/handle/123456789/302750
Type
journal article
