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College of Electrical Engineering and Computer Science / 電機資訊學院
Photonics and Optoelectronics / 光電工程學研究所
Feasibility Study of Utilizing HMDSO Film as Bottom Antireflective Coating for 157 nm Lithography
Details
Feasibility Study of Utilizing HMDSO Film as Bottom Antireflective Coating for 157 nm Lithography
Journal
45th EIPBN
Pages
372-373
Date Issued
2001-01
Author(s)
C.H. Lin
L. A. Wang
LON A. WANG
URI
http://scholars.lib.ntu.edu.tw/handle/123456789/294534
Type
conference paper