Large Area Nanostructure Pattering with Roof-Collapsed PDMS by Chemical Lift-Off Lithography

Conventional Photolithography is an important technique in array patterning. However, diffraction of light occurring in the process limits the pattern resolution significantly. Herein, well-designed roof-collapsed polydimethylsiloxane (PDMS) stamps incorporated with chemical lift-off lithography (CLL) is used to print large area features with high resolution. When pre-designed stamp features come into contact with the substrate, parts of the PDMS stamp collapse onto the surface and creates gaps between the original contacting and the collapsing areas. These resulting gaps were found to be 10-fold smaller than the stamp feature sizes. Large area nanostructure patterning can therefore be achieved through the use of micro scale feature design.