Effective reduction of interfacial traps in Al2 O 3/GaAs (001) gate stacks using surface engineering and thermal annealing
Journal
Applied Physics Letters
Journal Volume
97
Journal Issue
11
Date Issued
2010
Author(s)
Chang, Y.C.
Merckling, C.
Penaud, J.
Lu, C.Y.
Wang, W.-E.
Dekoster, J.
Meuris, M.
Caymax, M.
Heyns, M.
Kwo, J.
Type
journal article