Band offsets and charge storage characteristics of atomic layer deposited high-k HfO2/TiO2 multilayers

Resource

Applied Physics Letters 90 (262901)

Journal

Applied Physics Letters

Journal Volume

90

Journal Issue

262901

Pages

-

Date Issued

2007

Date

2007

Author(s)

Maikap, S.

Wang, T.Y.

Tzeng, P.J.

Lin, C.H.

Tien, T. C.

Lee, L. S.

Yang, J. R.

Tsai, M.J.

URI

Type

journal article

File(s)

Name

6.pdf

Size

398.7 KB

Format

Adobe PDF

Checksum

(MD5):6e7dde6a088190f24bf5142b06988ba5