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College of Electrical Engineering and Computer Science / 電機資訊學院
Electrical Engineering / 電機工程學系
Characterization of the Ultrathin HfO2 and Hf-Silicate Films Grown by Atomic Layer Deposition
Details
Characterization of the Ultrathin HfO2 and Hf-Silicate Films Grown by Atomic Layer Deposition
Resource
IEEE Transactions on Electron Devices 54 (4): 759-766
Journal
IEEE Transactions on Electron Devices
Journal Volume
54
Journal Issue
4
Pages
759-766
Date Issued
2007
Date
2007
Author(s)
Chen, Tze Chiang
Peng, Cheng-Yi
Tseng, Chih-Hung
Liao, Ming-Han
Chen, Mei-Hsin
Wu, Chih-I
Chern, Ming-Yau
Tzeng, Pei-Jer
Liu, Chee Wee
DOI
10.1109/TED.2007.892012
URI
http://ntur.lib.ntu.edu.tw//handle/246246/148250
http://ntur.lib.ntu.edu.tw/bitstream/246246/148250/1/79.pdf
Type
journal article
File(s)
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Name
79.pdf
Size
590.86 KB
Format
Adobe PDF
Checksum
(MD5):6aafcca190563bb3fb621d71519c6e92
