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College of Electrical Engineering and Computer Science / 電機資訊學院
Electrical Engineering / 電機工程學系
Reducing Si reflectance by improving density and uniformity of Si nanowires fabricated by metal-assisted etching
Details
Reducing Si reflectance by improving density and uniformity of Si nanowires fabricated by metal-assisted etching
Journal
Optics InfoBase Conference Papers
Date Issued
2010
Author(s)
Shiu, S.-C.
Lin, S.-B.
CHING-FUH LIN
URI
http://www.scopus.com/inward/record.url?eid=2-s2.0-84894055646&partnerID=MN8TOARS
http://scholars.lib.ntu.edu.tw/handle/123456789/357954
Type
conference paper
