Semi-insulating crystalline silicon formed by oxygen doping during low-temperature chemical vapor deposition

Journal

Applied Physics Letters

Journal Volume

62

Journal Issue

10

Pages

1102-1104

Date Issued

1993

Author(s)

Schwartz, P.V.

Liu, C.W.

Sturm, J.C.

DOI

10.1063/1.108755

URI

http://www.scopus.com/inward/record.url?eid=2-s2.0-0041815094&partnerID=MN8TOARS

http://scholars.lib.ntu.edu.tw/handle/123456789/303374

Type

journal article