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College of Electrical Engineering and Computer Science / 電機資訊學院
Photonics and Optoelectronics / 光電工程學研究所
Beyond the 130 nm-Generation by Employing DUV Lithography
Details
Beyond the 130 nm-Generation by Employing DUV Lithography
Journal
International Conference on Next Decades of High Technologies’98
Pages
143-145
Date Issued
1998-01
Author(s)
L. A. Wang
H. L. Chen
C. H. Lin
LON A. WANG
URI
http://scholars.lib.ntu.edu.tw/handle/123456789/342847
Type
conference paper