Reduction of Polarization and Swing Effects in a High Numerical Aperture Exposure System by utilizing Resist Antireflective Coatings

Resource

Microelectronic Engineering 86 (1): 83-87

Journal

Microelectronic Engineering

Journal Volume

86

Journal Issue

1

Pages

83-87

Date Issued

2008

Date

2008

Author(s)

Chen, H. L.

Lee, W. H.

Fan, Wonder

Chuang, S. Y.

Lai, Y. H.

Lee, C. C.

URI

Type

journal article

File(s)

Name

35.pdf

Size

832.23 KB

Format

Adobe PDF

Checksum

(MD5):b739ff81ad689e86614cbaf4f4868b1d