Plasmonic Fresnel Zone Plate for Nanolithography
Date Issued
2008
Date
2008
Author(s)
Cheng, Yi-Wei
Abstract
Photolithography is mostly used to transfer the mask patterns to the wafer for the current semiconductor fabrications. The resolution of the image is limited by the diffraction limit. We use three-dimensional finite-difference time-domain method to study the focusing properties of the silver nanostructured Fresnel zone plates. We found that silver nanostructured Fresnel zone plates can have the focus beyond the diffraction limit by the plasmonic effects. The electric field and Poynting vectors for different silver Fresnel zone plates are analyzed by varying the number of zones, the silver slab thickness, etc. The depth, position, size and intensity of focus are also studied. The angular spectrum representation is used to investigate the physical mechanism of that the silver Fresnel zone plates can get the focus beyond the diffraction limit. We also find that the evanescent waves are much more important than the propagating waves to shape the electric fields and Poynting vectors. The designed silver Fresnel zone plates are fabricated by the standard semiconductor fabrication process. They are measured by the near-field scanning optical microscopy. Our study in silver nanostructured Fresnel zone plates can be used to design the plasmonic nanolithography prototype.
Subjects
Fresnel zone plates
surface plasmon
angular spectrum representation
near-field scanning optical microscopy
nanolithography
Type
thesis
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