Optimized bilayer hexamethyldisiloxane film as bottom antireflective coating for both KrF and ArF lithographies
Journal
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Journal Volume
18
Journal Issue
6
Pages
3323-3327
Date Issued
2000
Author(s)
Abstract
The hexamethyldisiloxane (HMDSO) film was demonstrated as a bilayer bottom antireflective coating (BARC) layer for KrF and ArF lithographies. The materials of the bilayer can be varied to have suitable optical constants as BARC materials, by adjusting the gas flow rate ratio. The bilayer was also shown to be capable of providing large thickness controlled tolerance.
Other Subjects
Antireflection coatings; Chemical vapor deposition; Electron cyclotron resonance; Mathematical models; Photolithography; Plasma etching; Thermal effects; Bottom antireflective coating (BARC); Hexamethyldisiloxane films; Semiconducting films
Type
journal article