The effects of shower head orientation and substrate position on the uniformity of GaN growth in a HVPE reactor

Journal

Journal of the Taiwan Institute of Chemical Engineers

Journal Volume

40

Journal Issue

4

Pages

475-478

Date Issued

2009

Author(s)

Lan, W.C.

Tsai, C.D.

DOI

10.1016/j.jtice.2008.12.008

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/444898

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-67349135764&doi=10.1016%2fj.jtice.2008.12.008&partnerID=40&md5=ec0a08856fa58cc0b34613b3c6690c44

Type

journal article