Pattern Planarization Model of Chemical Mechanical Polishing

Journal

Journal of the Electrochemical Society

Journal Volume

146

Journal Issue

2

Pages

744-748

Date Issued

1999

Author(s)

Lee, B.-S.

DOI

10.1149/1.1391674

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/447189

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-0033076595&doi=10.1149%2f1.1391674&partnerID=40&md5=b699f6f044460f45898100e9b3838b42

Type

journal article