Additional Nitrogen Ion-Implantation Treatment in STI to Relax the Intrinsic Compressive Stress for n-MOSFETs

Resource

IEEE TRANSACTIONS ON ELECTRON DEVICES, 59(8), 2033-2036

Journal

IEEE Transactions on Electron Devices

Pages

2033-2036

Date Issued

2012

Date

2012

Author(s)

Liao, M.-H.

Chen, Chih Hua

Chang, Li Cheng

Yang, Chen

Kao, Ssu Chieh

DOI

URI

Type

journal article

File(s)

Name

index.html

Size

23.45 KB

Format

HTML

Checksum

(MD5):228e430508b65f4ff9bc931716614c0b