Robust control design for vibration isolation of an electron beam projection lithography system

Journal

Japanese Journal of Applied Physics

Journal Volume

49

Journal Issue

6 PART 2

Date Issued

2010

Author(s)

Hong, M.-F.

Wang, Fu-Cheng

Hong, Min-Feng

Yen, Jia-Yush

DOI

10.1143/JJAP.49.06GE04

URI

http://www.scopus.com/inward/record.url?eid=2-s2.0-77955321322&partnerID=MN8TOARS

http://scholars.lib.ntu.edu.tw/handle/123456789/356042

Type

journal article