Fabry-Perot type antireflective coatings for binary mask applications in ArF and F 2 excimer laser lithographies

Journal

Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest

Journal Volume

2

Pages

757-

Date Issued

2003

Author(s)

Chen, H.L.

Lee, C.C.

Chuang, Y.F.

Liu, M.C.

Hsieh, C.I.

Ko, F.H.

DOI

10.1109/CLEOPR.2003.1277293

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/491371

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-84955317148&doi=10.1109%2fCLEOPR.2003.1277293&partnerID=40&md5=00f0bd399cd32eec5be17e45b4ad9293

Type

conference paper