TiNi形狀記憶合金以脈衝電漿沉積HMDSN薄膜之研究
The Study on PPHMDSN Thin Film Deposited on TiNi SMA by DC-pulsed PECVD
Date Issued
2006
Date
2006
Author(s)
Chen, Chien-Hui
DOI
zh-TW
Abstract
SiC:H organic-like thin films are deposited on TiNi shape memory alloy (SMA) by DC-pulsed plasma enhanced chemical vapor deposition (PECVD) of HMDSN and Ar gas mixtures at room temperature. The organic-like thin films containing peroxides or free radicals can be subsequently grafted with hydrophilic polymer acrylamide (AAm) by UV-induced grafting polymerization. Heparin is immobilized onto grafted-AAm thin films to take TiNi SMA into the anti-thrombin biomaterials. The deposition rate of the plasma-polymerized HMDSN (PPHMDSN) thin film is fast and the root mean square surface roughness is between 2~4 nm. The PPHMDSN thin films not only enhance the corrosion resistance but make the corrosion current density decay four orders. Based on the micro-FTIR spectra, the Si-C and C-H bonds of the original HMDSN monomer are destroyed and new Si-H and C=O bonds are formed. The success of grafting is proved by FTIR. After grafting polymerization of AAm, a new dense organic thin films layer is formed in which the water contact angle decreases from 87° to 36° and the friction coefficient becomes lower. These properties are beneficial to the biomedical applications. According to XPS, the element S can be detected to prove that heparin is covalently immobilized on TiNi SMA.
Subjects
TiNi形狀記憶合金
六甲基二矽胺
脈衝式電漿輔助化學沉積法
丙烯醯胺(AAm)
肝素
TiNi shape memory alloy
HMDSN
DC-Pulsed PECVD
AAm
Heparin
Type
thesis
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