Provably Good Max-Min-m-Neighbor-TSP-Based Subfield Scheduling for Electron-Beam Photomask Fabrication
Journal
IEEE Transactions on Very Large Scale Integration (VLSI) Systems
Journal Volume
7372596
Pages
324-337
Date Issued
2018
Author(s)
Zhi-Wen Lin
Shao-Yun Fang
Yao-Wen Chang
Fellow
IEEE
Wei-Cheng Rao
Chieh-Hsiung Kuan
CHIEH-HSIUNG KUAN
Type
journal article