Fabrication and Analysis of GaAs/AlxOy - Three Dimensional Photonic Crystal and its Defect Structures
Date Issued
2005
Date
2005
Author(s)
Hsu, Chia-Ming
DOI
zh-TW
Abstract
Photonic crystal is an unique structure. It is a kind of periodic variation of dielectric constant by various fabrication processes. Photonic crystal has a special characteristic—photonic bandgap—which the light with certain frequency will not propagate in .
We use the “auto-cloning technique” to fabricate three dimensional photonic crystal. On the two dimensional checker-board pattern template, we alternate periodically the depositions of two materials which have different percentage of Al composition. Our material is GaAs system. Then the refractive index difference is changed by using wet oxidation. After wet oxidation the difference is increased to about 2 to fabricate 3D-FCC-photonic crystal.
The subject of our research is the influence of the following variations on the photonic bandgap: (i) periods variation; (ii) defect region size variation; (iii) oblique transmission characteristics. Increasing the number of periods will make photonic bandgap more obvious. With increasing defect size, we observed the red shift of defect modes. With oblique incidence, photonic bandgap width will increase.
Subjects
光子晶體
砷化鎵
氧化鋁
缺陷
photonic crystal
GaAs
AlxOy
defect
Type
thesis
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