Feasibility of utilizing hexamethyldisiloxane film as a bottom antireflective coating for 157 nm lithography

Journal

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Journal Volume

19

Journal Issue

6

Pages

2357-2361

Date Issued

2001-11

Author(s)

C.H. Lin

L.A. Wang

DOI

URI

Type

journal article