Fabrication of Diffractive Optical Elements Using the CMOS Process
Resource
J. Micromechanics and Microengineering 12: 21-25
Journal
Journal of Micromechanics and Microengineering
Pages
21-25
Date Issued
2002
Date
2002
Author(s)
Abstract
In this paper we propose a novel diffractive optical element (DOE) which is fabricated by the conventional complementary metal-oxide semiconductor (CMOS) process. A simple post-CMOS process is employed to establish the relief pattern. The pattern can be used directly for its optical properties or can serve as a mould for subsequent replication. In this study we design a DOE with eight-phase-level gratings, which is compatible with the CMOS process. The eight-phase-level gratings have 81.4% diffraction efficiency calculated by computational and theoretical analyses. The experiment finished four-phase-level gratings.
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