Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing

Journal

Scientific Reports

Journal Volume

7

Date Issued

2017

Author(s)

Shih H.-Y.

Lee W.-H.

Kao W.-C.

Chuang Y.-C.

Lin R.-M.

Lin H.-C.

Shiojiri M.

DOI

10.1038/srep39717

URI

https://www.scopus.com/inward/record.uri?eid=2-s2.0-85007545369&doi=10.1038%2fsrep39717&partnerID=40&md5=771bf2c92837503da94bfc8df0a098ed

https://scholars.lib.ntu.edu.tw/handle/123456789/432412

Publisher

Nature Publishing Group

Type

journal article