The characteristic behavior of TMAH water solution for anisotropic etching on both silicon substrate and SiO2 layer
Resource
SENSORS AND ACTUATORS A-PHYSICAL,93(2),132-137.
Journal
SENSORS AND ACTUATORS A-PHYSICAL
Journal Volume
93
Journal Issue
2
Pages
132-137
Date Issued
2001-09
Date
2001-09
Author(s)
Chen, PH
Peng, HY
Hsieh, CM
Chyu, MK
Type
journal article