Errata: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects

Resource

Journal of Micro/Nanolithography, MEMS, and MOEMS, 10(2), 029801

Journal

Journal of Micro/Nanolithography MEMS and MOEMS

Pages

29801

Date Issued

2011

Date

2011

Author(s)

Ng, Philip C.W.

Lee, Yen-Min

Wang, Fu-Min

DOI

URI

Type

journal article

File(s)

Name

50.pdf

Size

23.47 KB

Format

Adobe PDF

Checksum

(MD5):c76f24156ec8378109fd340e6c27f1c1