Skip to main content
English
中文
Log In
Log in
Log in with ORCID
NTU Single Sign On
Have you forgotten your password?
Home
College of Electrical Engineering and Computer Science / 電機資訊學院
Photonics and Optoelectronics / 光電工程學研究所
Silicon-Oxynitride Films Prepared for 157 nm Attenuated Phase Shifting Masks
Details
Silicon-Oxynitride Films Prepared for 157 nm Attenuated Phase Shifting Masks
Journal
24th SPIE International Symposium on Microlithography
Pages
1085-1092
Date Issued
1999-01
Author(s)
H. L. Chen
F. D. Lai
L. A. Wang
LON A. WANG
URI
http://scholars.lib.ntu.edu.tw/handle/123456789/352330
Type
conference paper