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College of Electrical Engineering and Computer Science / 電機資訊學院
Photonics and Optoelectronics / 光電工程學研究所
A Tri-layer Film Design as Bottom Antireflective Coating for KrF, ArF and F2 Lithographies
Details
A Tri-layer Film Design as Bottom Antireflective Coating for KrF, ArF and F2 Lithographies
Journal
Micro- and Nano-Engineering
Pages
242-243
Date Issued
2003-01
Author(s)
W. C. Cheng
L. A. Wang
LON A. WANG
URI
http://scholars.lib.ntu.edu.tw/handle/123456789/304320
Type
conference paper