Low alkaline contamination bilayer bottom antireflective coatings in F2 excimer laser lithography
Journal
Electrochemical and Solid-State Letters
Journal Volume
5
Journal Issue
9
Date Issued
2002
Author(s)
Abstract
A bilayer bottom antireflective coating (BARC) structure composed of tetraethoxysilane (TEOS) oxide and silicon nitride film stacks is demonstrated for excimer laser (157 nm) lithography. The top TEOS oxide film is an contaminant-free material that can be used as an capping layer. After an oxygen plasma treatment, the bilayer structure is shown to have high thermal stability by thermal desorption spectrometry. The measured swing effect is significantly reduced by adding the bilayer BARC structure. This BARC structure could also reduce the reflectance of various highly reflective substrates to less than 2% at 157 nm. © 2002 The Electrochemical Society. All rights reserved.
SDGs
Type
journal article