Focused Ion Beam Vacuum Lithography of InP with an Native Oxide Resist

Resource

Proceedings of SPIE--the International society for Optical Engineering, v.1392, p.588-595

Journal

Proceedings of SPIE--the International society for Optical Engineering

Journal Volume

v.1392

Pages

588-595

Date Issued

1991

Date

1991

Author(s)

Wang, Yuh-Lin

URI

Type

conference paper