Dual layer photoresist complimentary lithography applied on sapphire substrate for producing submicron patterns

Journal

Microsystem Technologies

Journal Volume

19

Journal Issue

11

Pages

1745-1751

Date Issued

2013

Author(s)

Chang, C.-M.

Chiang, D.

Shiao, M.-H.

Yang, C.-T.

Huang, M.-J.

Cheng, C.-T.

DOI

10.1007/s00542-013-1881-1

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/451905

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-84887235947&doi=10.1007%2fs00542-013-1881-1&partnerID=40&md5=d1dc47204f251dcdf69f979cf2dbc5b4

Type

conference paper