Skip to main content
English
中文
Log In
Log in
Log in with ORCID
NTU Single Sign On
Have you forgotten your password?
Home
College of Engineering / 工學院
Engineering Science and Ocean Engineering / 工程科學及海洋工程學系
Dual layer photoresist complimentary lithography applied on sapphire substrate for producing submicron patterns
Details
Dual layer photoresist complimentary lithography applied on sapphire substrate for producing submicron patterns
Journal
Microsystem Technologies
Journal Volume
19
Journal Issue
11
Pages
1745-1751
Date Issued
2013
Author(s)
Chang, C.-M.
Chiang, D.
Shiao, M.-H.
Yang, C.-T.
Huang, M.-J.
Cheng, C.-T.
WEN-JENG HSUEH
DOI
10.1007/s00542-013-1881-1
URI
https://scholars.lib.ntu.edu.tw/handle/123456789/451905
URL
https://www.scopus.com/inward/record.uri?eid=2-s2.0-84887235947&doi=10.1007%2fs00542-013-1881-1&partnerID=40&md5=d1dc47204f251dcdf69f979cf2dbc5b4
Type
conference paper