Enhancement of Dielectric Properties of Nanoscale HfO 2 Thin Films Via Atomic Layer Bombardment

Journal

ACS Applied Electronic Materials

Journal Volume

2

Journal Issue

8

Pages

2440-2448

Date Issued

2020

Author(s)

Yin, Y.-T.

Jiang, Y.-S.

Lin, Y.-T.

Chang, T.-J.

Lin, H.-C.

Chen, M.-J.

DOI

10.1021/acsaelm.0c00388

URI

https://www.scopus.com/inward/record.url?eid=2-s2.0-85089467600&partnerID=40&md5=28663a49806ab6e4db5c1c1d8718f0f6

https://scholars.lib.ntu.edu.tw/handle/123456789/546678

Type

journal article