Superparamagnetic Photopatternable Composite for Microstructures: Fabrication and Characterization
Date Issued
2012
Date
2012
Author(s)
Li, Chong-Shuo
Abstract
In this work, we propose a novel double-layer photolithography fabrication process which for fabricating microstructures with superparamagnetic photopatternable composites. The traditional method for patterning superparamagnetic composites requires multiple photolithography or etch processes. The proposed method need only a single photolithography process cycle to realize magnetic suspension microstructure. By using different exposure dose of UV light, the suspension thickness can be varied from 20μm to 100μm. Comparing to other fabrication process, our double layer spin-coated process is not only simpler, but also improves the surface flatness of the structure. Microstructures such as circular diaphragm and doubly-clamped beam are designed and fabricated successfully. We also measured the magnetization curve of the composite consisting of superparamagnetic Fe3O4 nanoparticle and SU8-2050 epoxy-based negative photoresist. The relationship between magnetic field and the deflection of the microstructure were measured and discussed. Also, the resonant frequencies of doubly-clamped structure were measured using a vibrometer. Under sinusoidal magnetic field of 10.37mT amplitude, a beam with 6mm in length is able to vibrate at a resonant frequency of 4.18 kHz with 224nm vibration amplitude.
Subjects
Magnetic nanocomposite
photopatternable magnetic composite
MEMS
doubly-clamped beam
superparamagnetic material
Type
thesis
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