Shallow level trap formation in SiO2 induced by high field and thermal stresses

Journal

Journal of Applied Physics

Journal Volume

103

Journal Issue

10

Date Issued

2008

Author(s)

Lin, H.-P.

Hwu, J.-G.

DOI

10.1063/1.2924428

URI

http://www.scopus.com/inward/record.url?eid=2-s2.0-44649124815&partnerID=MN8TOARS

http://scholars.lib.ntu.edu.tw/handle/123456789/338628

Type

journal article