Activation of Boron Implanted in Hg0.7Cd0.3Te by High-Temperature Annealing

Resource

Journal of Applied Physics, v.63 n.10, p.15

Journal

Journal of Applied Physics

Journal Volume

v.63 n.10

Pages

1-5

Date Issued

1988

Date

1988

Author(s)

Yang, Seng-Jenn

URI

Type

journal article