The kinetics of a negative-tone acrylic photoresist for 193-nm lithography

Resource

Journal of Polymer Science Part A: Polymer Chemistry, 38(6), 954-961

Journal

Journal of Polymer Science Part A Polymer Chemistry

Pages

954

Date Issued

2000

Date

2000

Author(s)

Fu, S. C.

Hsieh, K. H.

DOI

URI

Type

journal article

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