Enhanced thermally induced stress effect on an ultrathin gate oxide

Journal

Journal of Applied Physics

Journal Volume

91

Journal Issue

8

Pages

5423-5428

Date Issued

2002

Author(s)

Su, J.-L.

Hong, C.-C.

Hwu, J.-G.

DOI

10.1063/1.1452763

URI

http://www.scopus.com/inward/record.url?eid=2-s2.0-0037091888&partnerID=MN8TOARS

http://scholars.lib.ntu.edu.tw/handle/123456789/296938

Type

journal article