The improvement of high temperature oxidation of Ti-50Al by sputtering Al film and subsequent interdiffusion treatment

Journal

Acta Materialia

Journal Volume

51

Journal Issue

11

Pages

3109-3120

Date Issued

2003

Author(s)

Chu, M.S.

Wu, S.K.

DOI

10.1016/S1359-6454(03)00123-X

URI

http://www.scopus.com/inward/record.url?eid=2-s2.0-0037941269&partnerID=MN8TOARS

http://scholars.lib.ntu.edu.tw/handle/123456789/301728

Type

journal article