Extremely broad processing window for directed self-assembly of block copolymer films on atomically-thin graphene chemical patterns

Journal
SPIE: Advanced Lithography conference
Pages
425-457
Date Issued
2017
Author(s)
S. Xiong
T.-H. Chang
R. M. Jacobberger
M. S. Arnold
Z. Ma
P. F. Nealey
URI
Type
conference paper

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