Fabrication of nanoscale PtOx/PZT/PtOx capacitors by e-beam lithography and plasma etching with photoresist mask
Journal
Electrochemical and Solid-State Letters
Journal Volume
9
Journal Issue
3
Date Issued
2006
Author(s)
Abstract
Nanoscaling of capacitors in well-ordered arrays down to a cell size of was sucessfully achieved by electron-beam lithography and plasma etching with photoresist mask. Fast etch of and PZT layers was obtained with a rate of in plasma of and in , respectively. The selectivity of to NEB resist was 5.8 and that for PZT was 4.3. Crystallization of PZT film and reduction of layer were also observed after post-annealing of the etched specimens. Direct electrical measurement reveals that a good polarization switching characteristic can be retained in the nanoscaled PZT capacitors.
Type
journal article