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College of Electrical Engineering and Computer Science / 電機資訊學院
Electrical Engineering / 電機工程學系
Method for Adjusting Status of Particle Beams for Patterning A Substrate and System Using the Same (於一基板上製作圖案時之粒子束狀態調整方法及其系統)
Details
Method for Adjusting Status of Particle Beams for Patterning A Substrate and System Using the Same (於一基板上製作圖案時之粒子束狀態調整方法及其系統)
Date Issued
2014-08
Author(s)
Kuen-Yu Tsai
Sheng-Yung Chen
KUEN-YU TSAI
URI
http://scholars.lib.ntu.edu.tw/handle/123456789/388673
Type
patent