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College of Electrical Engineering and Computer Science / 電機資訊學院
Electrical Engineering / 電機工程學系
Use of SiO2 nanoparticles as etch mask to generate large-area GaAs nanowires by Induced-Coupled Plasma Reactive Ion Etcher
Details
Use of SiO2 nanoparticles as etch mask to generate large-area GaAs nanowires by Induced-Coupled Plasma Reactive Ion Etcher
Journal
Optics InfoBase Conference Papers
Date Issued
2009
Author(s)
Wang, D.-S.
Chao, J.-J.
CHING-FUH LIN
URI
http://www.scopus.com/inward/record.url?eid=2-s2.0-84897957968&partnerID=MN8TOARS
http://scholars.lib.ntu.edu.tw/handle/123456789/350116
Type
conference paper
