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  3. Environmental and Occupational Health Sciences / 環境與職業健康科學研究所
  4. 半導體業潛在砷暴露危害評估-實證資料分析
 
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半導體業潛在砷暴露危害評估-實證資料分析

Date Issued
2002-07-31
Date
2002-07-31
Author(s)
黃耀輝  
DOI
902320B002179
URI
http://ntur.lib.ntu.edu.tw//handle/246246/4957
Abstract
The aims of this study is to investigate the possible arsenic exposure among the maintenance engineers of wafer fabrication facilities, in order to predict the potential health risk after long-term occupational exposure to arsenic. For urinary arsenic level, average urinary arsenic levels of control group and maintenance engineers were 32.1±25.7 μ g/L and 32.8±29.1 μ g/L, respectively. However, by comparing the urine arsenic concentrations before and after workshift of three preventative maintenance engineers, occupationally exposure to arsenic is strongly suggested in the study site. Meanwhile, the average of Incremental Lifetime Cancer Risk of the maintenance engineers for working 5 years was 3.58×10 -5 , within the universally acceptable level of 10 -6 ~10 -4 . Besides, the simulation results of life cancer risk for those engineers not wearing personal protective equipment at work were nearly five times the risk for these wearing. The sensitivity analysis indicated that the input variables which are more sensitive in the risk estimation for preventative maintenance engineers exposure to arsenic are concentration of urinary arsenic, exposure frequency, and body weight.
Subjects
semiconductor
urinary arsenic
risk estimation
Monte Carlo
simulation
SDGs

[SDGs]SDG3

Publisher
臺北市:國立臺灣大學公共衛生學院職業醫學與工業衛生研究所
Type
report
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902320B002179.pdf

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