Thermal stability of Si/Si1 – x – yGexCy/Si quantum wells grown by rapid thermal chemical vapor deposition

Resource

Journal of Applied Physics 85 (4): 2124

Journal

Journal of Applied Physics

Journal Volume

85

Journal Issue

4

Pages

-

Date Issued

1999

Date

1999

Author(s)

Liu, C. W.

Tseng, Y. D.

Chern, M. Y.

Chang, C. L.

Sturm, J. C.

URI

Type

journal article

File(s)

Name

07.pdf

Size

117.66 KB

Format

Adobe PDF

Checksum

(MD5):371b8f68c398f0a8a25ed76bf621f72d